Al2O3- Sapphire Wafer, C-plane (0001), 0.5"x0.5"x1.0mm, 2Sp - ALC121210S2 Cold 1 Mpa 50 m-torr by

1 Mpa   50 m-torr by a mechanical pump

1    Pic

Material:                                  Natural ABS With ESD Coating

Application The cylinder cells are grooved it by MSK-500 and then crimped by MSK-510

which is designed for pressing pellet under magnetic field up to 2 metric Ton Force or < 170 MPa

Al2O3- Sapphire Wafer, C-plane (0001), 0.5"x0.5"x1.0mm, 2Sp - ALC121210S2 Cold 1 Mpa 50 m-torr byFeatures: Sapphire substrate is the popular substrates for III V nitrides, superconductor and magnetic epi film due to less mis matched lattice and stable chemical and physical properties. Wafer size: 0. 5" x 0. 5" x 1. 0 mm thick Orientation tolerance: + 0. 5 Deg. C plane orientation Polished surface: substrate surface is EPI polished via a special CMP procedure with RA < 8 A 2 sides polished Package: Each wafer is packed in 1000 class clean room